Horizontal Furnace for Thermal Wafer Processing: c.HORICOO 200
Horizontal furnace for multifold applications
The centrotherm c.HORICOO 200 is a field-proven and ultra-versatile tube furnace system that is available for mass and medium volume production as well as for R&D. It provides reliable process capabilities and high process performance for multiple applications, such as AP, LP and PECVD processes. Therefore, the process tubes can be configured for different processes with associated facilities (atmospheric, vacuum or mixed).
All furnaces are equipped with an integrated boat handling that enables the storage of up to 8 process boats as well as an integrated wafer transfer system. Outside influences are minimized by watercooled heating cassettes and a soft-landing system. Ease of maintenance ensures low cost of ownership and a high uptime.
- Atmospheric, PECVD and LPCVD processes
- Process specific configuration of individual tubes within the furnace
- Advanced water cooling system guarantees no thermal interference between different process tubes
- Modular component design for ease of installation and start up in clean room facilities
- Integrated lift for automated boat handling
- Integrated boat buffering and cooling system
- Fully automated Wafer-Transfer-System with Cassette-to-Cassette Handling