Horizontal high-throughput system for 300 mm wafers
The centrotherm c.HORICOO 300 horizontal batch-type system is the world‘s first high-throughput platform for state-of-the-art 300 mm wafer processing. The equipment platform consists of two 4-stack furnaces that are loaded by one central automation unit.
The heating system comprises 5 dual-zone heating elements that provide the centrotherm well-know temperature uniformity as well as an optimal and steady process. The centrotherm Hydrox system supports wet oxidation processes with different moisture contents.
Temperatures up to 1200 °C allow faster oxidation and shorter drive-in processes.