R&D Wafer Process System: c.VERTICOO Mini
Vertical wafer process system for mini-batch applications
c.VERTICOO Mini is a stand-alone Mini-Batch wafer processing tool ideally designed for thermal processes in R&D and low volume production.
The unique design of the centrotherm process chamber and heating system allows for operation at temperatures up to 1100°C. The centrotherm c.VERTICOO Mini furnace provides a high degree of flexibility for all standard atmospheric and low pressure processes due to the small batch size. This architecture allows customers to reduce development costs by processing a maximum of 50 wafers per batch.
The centrotherm design is outstanding for high performance, small footprint and low cost of ownership while offering the high process flexibility required for many semiconductor device fabrication steps. Verticoo mini is equipped with a thin wafer handling on demand.
- Discrete Semiconductors
- Power Semiconductors
- Photovoltaic Devices
- Atmospheric Processes