E1550: Horizontal Wafer Process System System
E1550: Horizontal Wafer Process System System

Horizontal furnace system for pilot production applications

The centrotherm c.E1550 horizontal furnace is optimized to support the multiple process capability needs of a small or medium volume production and features high process performance and flexibility. It contains up to 4 stacked quartz or SiC tube process chambers for wafer sizes up to 300 mm.

c.E1550 perfectly combines operational and maintenance costs with a small footprint and thus allows the user cost-effective production possibilities.


  • Atmospheric, PECVD and LPCVD processes
  • Process selectable chamber options available
  • Flatzone 600mm
  • Advanced water cooling system guarantees no thermal interference between different process tubes
  • Modular component design for ease of installation and start up in clean room facilities


  • Annealing
  • Diffusion
  • Oxidation


  • Fast-Cool-System
  • Integrated lift for automated boat handling
  • Integrated boat buffering and cooling system
  • Fully automated Wafer-Transfer-System with Cassette-to-Cassette Handling